DIADEM 2D

Platform name : DIADEM-2D – Thin film deposition platform in combinatorial synthesis by PVD HiPIMS assisted by AI

Location : CEA Saclay – INSTN

Contact : Paul Foulquier paul.foulquier@cea.fr

Abstract : DIADEM-2D is a platform for the deposition of thin layers in combinatorial synthesis by Physical Vapor Deposition (PVD) installed at the INSTN in Saclay. Metallic, oxide or nitride deposits are made there by HiPIMS sputtering with a thickness ranging from a hundred nanometers to several micrometers. Diadem-2D has 5 sample holders of 10x10cm surmounted by a mobile cathode carriage comprising 2 cathodes dedicated to the HiPIMS mode and 2 cathodes operating in pulsed DC mode. The HiPIMS mode is an original configuration allowing to significantly increase the density of the layers by reaching a plasma ionization rate of around 90%. The 4 cathodes of Diadem-2D are orientable allowing them to work in both confocal and off-axis mode.

Diadem-2D is a unique platform since it is dedicated to the autonomous deposition of thin layers. In this sense, it already integrates an Optical Emission Spectroscopy (OES) system allowing real-time characterization of the plasma composition. In the near future, it will be equipped with additional in-situ characterization tools and will integrate artificial intelligence control to make it completely autonomous. The idea is to autonomously adjust the deposition parameters in real time in order to obtain layers of the desired composition and microstructure. With this in mind, a digital twin of the machine will be created as part of a collaboration with CEA/LIST.

Technical characteristics :

4-cathode magnetron trolley for combinatorial synthesis that can work in confocal or off-axis mode
2 HiPIMS cathodes, 2 pulsed-DC sputtering cathodes
Sample size : 10x10cm
In-situ Optical Emission Spectroscopy (OES) device enabling analysis of plasma composition
Ex-situ characterization devices : SEM/EDS, XRD
Development of a digital twin of the platform in progress